Published January 2004 | Version v1
Journal article

Epitaxial growth of ferromagnetic Co:TiO2 thin films by co-sputtering

Description

Epitaxial anatase Co:TiO2 thin films were grown on LaAlO3 (0 0 1) substrates by co-sputtering method. Structural and compositional properties were measured as a function of deposition parameters to explore the growth mechanism of the anatase films. Epitaxial anatase structure can be obtained at deposition temperatures ranged from 500 deg. C to 750 deg. C. magnetization measurements show that the saturation magnetization (Ms) increases as deposition temperature increases. At 750 deg. C, Ms is about 1.13 μB/Co. X-ray diffraction results show that the sample has a superior anatase crystallinity with the full-width at half-maximum of 0.13 deg. . It was found that Ms is directly related with the crystallinity, i.e., Ms increases as the crystallinity of samples improves

Additional details

Additional titles

Augmented title (English)
75.50.Pp; 75.70.Cn; Magnetism; Semiconductors; Sputtering; Epitaxial growth; Titanium oxide

Identifiers

DOI
10.1016/S0304-8853(03)00492-X;
arXiv
arXiv:math/0109030v1;
PII
S030488530300492X;

Publishing Information

Journal Title
Journal of Magnetism and Magnetic Materials
Journal Volume
268
Journal Issue
1-2
Journal Page Range
p. 159-164
ISSN
0304-8853
CODEN
JMMMDC

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.