Method of generating magnetoactive plasma for forming thin surface layers on solid substrates and equipment therefor

The invention essentially consists in the use of the axially symmetrical high-frequency magnetized plasma column for thin layer formation. The plasma is generated using a cylindrical microwave slow-down structure in the outer magnetic field. Plasma particles density and temperature and their radial distribution are adjusted by changing the intensity of the magnetic field and of high-frequency power. The plasma may be generated from any gases in a pressure range of 10-3 to 102 Pa. In an oxygen plasma, e.g., it is thus possible to form layers of 200 nm in thickness in 60 mins at an input high-frequency power of 100 to 300 W. (J.U.)