Is the impact velocity of vacuum-deposited atoms of significance for the film structure
Description
The goal of this study was to investigate the effect of the impact velocity of the atoms on the structure of thin films generated by vacuum deposition. For that purpose all atoms faster or slower than a pre-selected velocity u were removed with a velocity filter from a beam of gold atoms obtained by thermal evaporation in vacuum (10-5 Pa). The residual atoms with a velocity u were deposited onto cold (80 K) glass substrates. The annealing behaviour of the films studied by means of d.c. resistance measurements indicates a correlation between film structure and impact velocity in the sense that films generated by means of low velocity atoms have a non-equilibrium structure which does not exist in films prepared by conventional vacuum deposition. (Auth.)
Additional details
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 101
- Journal Issue
- 1
- Series
- Thin Solid Films.
- Journal Page Range
- 55-59
- ISSN
- 0040-6090
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Switzerland
- INIS RN
- 14762993
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANNEALING; ATOMIC BEAMS; ELECTRIC CONDUCTIVITY; FILMS; GOLD; KINETIC ENERGY; LOW TEMPERATURE; MILLI EV RANGE; PHYSICAL RADIATION EFFECTS; TEMPERATURE DEPENDENCE; VAPOR DEPOSITED COATINGS; VELOCITY
- Descriptors DEC
- BEAMS; COATINGS; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY; ENERGY RANGE; HEAT TREATMENTS; METALS; PHYSICAL PROPERTIES; RADIATION EFFECTS; TRANSITION ELEMENTS