Study and optimal simulation of 4H—SiC floating junction Schottky barrier diodes' structures and electric properties
Creators
- 1. Department of Electric Engineering, Faculty of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048 (China)
Description
This paper stuides the structures of 4H—SiC floating junction Schottky barrier diodes. Some structure parameters of devices are optimized with commercial simulator based on forward and reverse electrical characteristics. Compared with conventional power Schottky barrier diodes, the devices are featured by highly doped drift region and embedded floating junction layers, which can ensure high breakdown voltage while keeping lower specific on-state resistance, and solve the contradiction between forward voltage drop and breakdown voltage. The simulation results show that with optimized structure parameter, the breakdown voltage can reach 4.36 kV and the specific on-resistance is 5.8 mΩ ·cm2 when the Baliga figure of merit value of 13.1 GW/cm2 is achieved. (condensed matter: electronic structure, electrical, magnetic, and optical properties)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/19/10/107304Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 19
- Journal Issue
- 10
- Journal Page Range
- [5 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45006900
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- COMPARATIVE EVALUATIONS; DOPED MATERIALS; ELECTRIC CONTACTS; ELECTRIC POTENTIAL; ELECTRICAL PROPERTIES; LAYERS; PERFORMANCE; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR JUNCTIONS; SILICON CARBIDES; VOLTAGE DROP
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; ELECTRICAL EQUIPMENT; EQUIPMENT; EVALUATION; MATERIALS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SILICON COMPOUNDS