Infrared dielectric functions and optical phonons of wurtzite YxAl1−xN (0 ⩽ x ⩽ 0.22)
Creators
- 1. Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-58183 Linköping (Sweden)
- 2. Department of Electrical Engineering, Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Lincoln, NE 68588-0511 (United States)
Description
YAlN is a new member of the group-III nitride family with potential for applications in next generation piezoelectric and light emitting devices. We report the infrared dielectric functions and optical phonons of wurtzite (0001) YxAl1−xN epitaxial films with 0 ⩽ x ⩽ 0.22. The films are grown by magnetron sputtering epitaxy on c-plane Al2O3 and their phonon properties are investigated using infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The infrared-active E 1(TO) and LO, and the Raman active E 2 phonons are found to exhibit one-mode behavior, which is discussed in the framework of the MREI model. The compositional dependencies of the E 1(TO), E 2 and LO phonon frequencies, the high-frequency limit of the dielectric constant, , the static dielectric constant, , and the Born effective charge Z B are established and discussed. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/48/41/415102Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 48
- Journal Issue
- 41
- Journal Page Range
- [8 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51046570
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ALUMINIUM OXIDES; DIELECTRIC MATERIALS; EFFECTIVE CHARGE; ELLIPSOMETRY; EPITAXY; FILMS; MAGNETRONS; PHONONS; PIEZOELECTRICITY; RAMAN EFFECT; SPECTROSCOPY; SPUTTERING
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CRYSTAL GROWTH METHODS; ELECTRICITY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MATERIALS; MEASURING METHODS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; QUASI PARTICLES