Measurement of the sputtering yield for Ar+ and Ar2+ ions on gold films

The sputtering yield on gold was measured for the argon ions Ar+ and Ar2+. The ions were produced with a fine beam saddle field ion source, and a magnetic analyser was used to separate the ions which were focused with an Einzel lens onto an evaporated film of gold on a glass substrate. It was found that at normal incidence the yield increased from about 4 to 11 atoms per ion as the ion energy increased from 3 to 13.5 keV, but the yield was independent of the charge state of the ions. (Auth.)