Published July 3, 2015 | Version v1
Journal article Metadata-only

Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films

Creators

  • 1. Department of Materials Science and Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei, 10617, Taiwan (China)
  • 2. Department of Traumatology, National Taiwan University Hospital, Taipei 10002, Taiwan (China)

Description

Plasmonic silver nanostructures and a precise ZnO cover layer prepared by capacitively coupled plasma atomic layer deposition (ALD) were exploited to enhance the Raman scattering from nanoscale ultrathin films on a Si substrate.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/26/26/265702

Additional details

Identifiers

DOI
10.1088/0957-4484/26/26/265702;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
26
Journal Issue
26
Journal Page Range
[9 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51040606
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
DEPOSITION; DIELECTRIC MATERIALS; LAYERS; NANOFILMS; NANOSTRUCTURES; RAMAN EFFECT; SILVER; SUBSTRATES; ZINC OXIDES
Descriptors DEC
CHALCOGENIDES; ELEMENTS; FILMS; MATERIALS; METALS; NANOMATERIALS; OXIDES; OXYGEN COMPOUNDS; THIN FILMS; TRANSITION ELEMENTS; ZINC COMPOUNDS