Published 2001 | Version v1
Report Metadata-only

Discharges with a uniformly evaporating cathode or anode

Creators

Description

The design of a deposition system with a plasma source having a hollow cathode with an insert is given. The source has the advantage of a uniform discharge and evaporation rate

Availability note (English)

Available from British Library Document Supply Centre- DSC:9023.190(9870)T

Additional details

Publishing Information

Imprint Pagination
9 p.
Report number
VR-Trans--9870

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
32022064
Subject category
S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Translation, Non-conventional Literature
Descriptors DEI
HOLLOW CATHODES; ION SOURCES; IONIZATION; PHYSICAL VAPOR DEPOSITION; SPUTTERING
Descriptors DEC
CATHODES; DEPOSITION; ELECTRODES; SURFACE COATING

Optional Information

Notes
Translated from Russian (Problemy Spetsial'noi Elektrometallurgii 2000 (3) p. 44-54)