Published 2003 | Version v1
Journal article

Atomic layer deposition of ZnO thin films and dot structures

  • 1. Institute of Physics, Polish Academy of Sciences, Warsaw (Poland)
  • 2. Warsaw Agricultural Univ. (Poland). Dept. of Physiological Sciences
  • 3. Macquarie Univ., North Ryde (Australia), Division of Information and Communication Sciences
  • 4. University of Technology, Sydney(Australia). Microstructural Analysis Unit

Description

Successful growth of thin films and quantum dots of ZnO by atomic layer deposition (ALD) is reported. Properties of ZnO films produced by four different ALD-procedures and by oxidation of ALD-grown ZnS films are discussed. The use of thin ZnO films as buffer layers for GaN deposition is also shortly described. (author)

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Publishing Information

Journal Title
Proceedings of the Estonian Academy of Sciences. Physics, Mathematics
Journal Volume
52
Journal Issue
3
Journal Page Range
p. 277-288
ISSN
1406-0086

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