Published August 2021 | Version v1
Journal article

Elucidating the mechanistic origins of P dopants triggered active sites and direct Z-scheme charge transfer by P-MoS2@WO3 heterostructures for efficient photocatalytic hydrogen evolution

  • 1. School of Physics and Electronic Information Engineering, Qinghai Normal University, Qinghai 810004 (China)
  • 2. School of Physical Science and Technology, Lanzhou University, Lanzhou 730000 (China)
  • 3. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemicals Physics, Chinese Academy of Sciences, Lanzhou 730000 (China)

Description

Highlights: • The doped nonmetal P elements provide abundant active sites on the stable basal (002) plane of MoS2. • The heterojunction P-MoS2@WO3 provides an efficient thoroughfare to facilitate the separation of electron-hole pairs. • The optoelectronic transfer pathway with a direct Z-scheme charge mode at the interface of the P-MoS2@WO3 heterostructures. -- Abstract: MoS2 has been proven to be an environmental-friendly and economic photocatalyst for clean energy generation. However, the energy conversion efficiency still needs to be more enhanced for practical application due to the limited number of active sites on the surface and the high recombination rate of electron-hole pairs. Herein, P-doping was utilized to increase the active sites, and the heterojunction was constructed with WO3 to improve the charge separation rate. Our results show that the heterojunction P-MoS2@WO3 photocatalyst has a stable and durable photocatalytic activity in water splitting, which shows H2 evolution rate of 73.8 μmol h–1 g−1. This good photocatalytic performance of P-MoS2@WO3 is attributed to increased active sites at the thermodynamically stable basal (002) plane of MoS2 by the P-doping and the enhanced charge separation rate by the heterojunction with a direct Z-scheme mode. This study offers an efficient way to increase the active sites and separate charge carriers in MoS2-based photocatalysts for H2 generation.

Additional details

Identifiers

DOI
10.1016/j.jallcom.2021.159637;
PII
S092583882101046X;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
872
Journal Page Range
vp.
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.