Published April 2005
| Version v1
Journal article
Measurement of Thickness Distribution of Si3N4 Membrane Using Phase-Shifting Interferometer
- 1. Pohang University of Science and Technology, Pohang (Korea, Republic of)
Description
The thickness of a Si3N4 thin film with a 100m nominal thickness was measured by use of a Mach-Zehnder interferometer. The map of the phase-delay through the thin film was obtained by an interframe intensity-correlation-matrix method that could eliminate phase-shifting errors. After the spatial phase-shifting errors were treated with a least-squares method, the reference to surface of the phase map was estimated. The overall accuracy of the method was found to be 5nm
Additional details
Publishing Information
- Journal Title
- Journal of the Korean Society for Nondestructive Testing
- Journal Volume
- 25
- Journal Issue
- 2
- Series
- 11 refs, 9 figs
- Journal Page Range
- p. 67-73
- ISSN
- 1225-7842
INIS
- Country of Publication
- Korea, Republic of
- Country of Input or Organization
- Korea, Republic of
- INIS RN
- 42042503
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ERRORS; INTERFEROMETERS; MEMBRANES; PHASE SHIFT; SILICON ALLOYS; THICKNESS; THIN FILMS
- Descriptors DEC
- ALLOYS; DIMENSIONS; FILMS; MEASURING INSTRUMENTS