Optimized properties of xBiInO3-(1-x)PbTiO3 thin films deposited by an RF-magnetron sputtering method
- 1. Laboratory of Modern Acoustics, Institute of Acoustics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing (China)
- 2. Graduate School, Yokohama City University, Yokohama (Japan)
Description
Ferroelectric xBiInO3-(1-x)PbTiO3 (x = 0.15, 0.20, 0.25, and 0.30) thin films are deposited on (101)SrRuO3/(100)Pt/(100)MgO substrates by an RF-magnetron sputtering method. By adjusting the deposition conditions, the electric properties of the thin films are optimized. The ferroelectricities of the thin films show that the remnant polarizations (Pr) decrease from 43 to 34 μC cm-2 as x increases from 0.15 to 0.25, and the coercive fields (Ec) are about 177 kV cm-1. The Curie temperatures (Tc) increase from 580 to 650 C on increasing x from 0.15 to 0.30. The results illustrate that the xBI-(1-x)PT films have high ferroelectricities, high coercive fields, and high Curie temperatures simultaneously, which may have wide potential applications in high-temperature and -voltage environments. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssa.201600026Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi. A, Applications and Materials Science
- Journal Volume
- 213
- Journal Issue
- 9
- Journal Page Range
- p. 2479-2484
- ISSN
- 1862-6300
- CODEN
- PSSABA
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 47117079
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- BISMUTH OXIDES; CERAMICS; CHEMICAL COMPOSITION; COERCIVE FORCE; CURIE POINT; ELECTRIC CONDUCTIVITY; FERROELECTRIC MATERIALS; INDIUM OXIDES; LEAD COMPOUNDS; PERMITTIVITY; POLARIZATION; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; TITANATES; VAPOR DEPOSITED COATINGS; X-RAY DIFFRACTION
- Descriptors DEC
- BISMUTH COMPOUNDS; CHALCOGENIDES; COATINGS; COHERENT SCATTERING; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; FILMS; INDIUM COMPOUNDS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION TEMPERATURE
Optional Information
- Notes
- With 6 figs., 3 tabs.