Published April 2009 | Version v1
Journal article

Raman scattering studies on manganese ion-implanted GaN

  • 1. Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071 (China)

Description

This paper reports that the Raman spectra have been recorded on the metal-organic chemical vapour deposition epitaxially grown GaN before and after the Mn ions implanted. Several Raman defect modes have emerged from the implanted samples. The structures around 182 cm−1 modes are attributed to the disorder-activated Raman scattering, whereas the 361 cm−1 and 660 cm−1 peaks are assigned to nitrogen vacancy-related defect scattering. One additional peak at 280 cm−1 is attributed to the vibrational mode of gallium vacancy-related defects and/or to disorder activated Raman scattering. A Raman-scattering study of lattice recovery is also presented by rapid thermal annealing at different temperatures between 700 °C and 1050 °C on Mn implanted GaN epilayers. The behaviour of peak-shape change and full width at half maximum (FWHM) of the A1(LO) (733 cm−1) and EH2 (566 cm−1) Raman modes are explained on the basis of implantation-induced lattice damage in GaN epilayers. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/18/4/059

Additional details

Identifiers

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
18
Journal Issue
4
Journal Page Range
p. 1637-1642
ISSN
1674-1056