Published December 1, 2012 | Version v1
Journal article

Measurement of beam waist for an optical cavity based on Gouy phase

  • 1. Department of Engineering Physics, Tsinghua University, Beijing 100084 (China)
  • 2. KEK: High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0801 (Japan)
  • 3. Department of Accelerator Science, School of High Energy Accelerator Science, Graduate University for Advanced Studies, Shonan International Village, Hayama, Miura, Kanagawa 240-0193 (Japan)

Description

Optical cavities have a variety of applications. However, a highly accurate and efficient method for measuring cavity beam waist size is urgently needed. In this article, we propose a simple approach to deduce the optical cavity beam waist size in terms of Gouy phase using a round-trip matrix for n-mirror cavities. Since Gouy phase can be easily and accurately obtained, this approach provides an alternative way of measuring the beam waist size. Experimentally, the effectiveness of this new method has been demonstrated in a 2-mirror cavity and a 4-mirror planar cavity. The results of beam waist size measurement show fairly good agreement with theoretically predicted values. This method is much simpler, and more convenient than other beam waist size measurement methods, e.g. methods based on pinhole photodiode or CCD.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nima.2012.07.022

Additional details

Identifiers

DOI
10.1016/j.nima.2012.07.022;
PII
S0168-9002(12)00789-9;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
694
Journal Page Range
p. 6-10
ISSN
0168-9002
CODEN
NIMAER

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45023141
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Descriptors DEI
BEAMS; CAVITIES; CHARGE-COUPLED DEVICES; COMPTON EFFECT; MATRICES; MIRRORS
Descriptors DEC
BASIC INTERACTIONS; ELASTIC SCATTERING; ELECTROMAGNETIC INTERACTIONS; INTERACTIONS; SCATTERING; SEMICONDUCTOR DEVICES

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.