Published August 15, 2008 | Version v1
Journal article

First-principles calculations of ethanethiol adsorption and decomposition on GaN (0 0 0 1) surface

  • 1. State Key Laboratory of Structural Chemistry, Fuzhou, Fujian 350002 (China)
  • 2. Department of Chemistry, Fuzhou University, Fuzhou, Fujian 350002 (China)

Description

The adsorption and decomposition of ethanethiol on GaN (0 0 0 1) surface have been investigated with first-principles calculations. The DFT calculations reveal that ethanethiol adsorbs dissociatively on the clean GaN (0 0 0 1) surface to form ethanethiolate and hydrogen species. An up limit coverage of 0.33 for ethanethiolate monolayer on GaN (0 0 0 1) surface is obtained and the position of the sulfur atom and the tilt angle of the thiolate chain are found to be very sensitive to the surface coverage. Furthermore, the reactivity of ethanethiol adsorption and further thermal decomposition reactions on GaN (0 0 0 1) surface is discussed by calculating the possible reaction pathways and ethene is found to be the major product

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2008.04.014

Additional details

Identifiers

DOI
10.1016/j.apsusc.2008.04.014;
PII
S0169-4332(08)00720-4;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
254
Journal Issue
20
Journal Page Range
p. 6514-6520
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40033627
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ADSORPTION; GALLIUM NITRIDES; HYDROGEN; PACKINGS; PYROLYSIS; REACTIVITY; STOWING; SULFUR; SURFACES
Descriptors DEC
CHEMICAL REACTIONS; DECOMPOSITION; ELEMENTS; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; SORPTION; THERMOCHEMICAL PROCESSES

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.