Published September 27, 2009
| Version v1
Journal article
The Effect Of Spectral Lines Choice For Depth Profiling LIPS Experiment
- 1. National Institute of Laser Enhanced Science (NILES), Cairo University (Egypt)
- 2. Laser Research Institute (LRI), Physics Department, University of Stellenbosch (South Africa)
Description
Laser-induced Plasma spectroscopy (LIPS) is a useful method for determining the elemental composition of various materials but for long time it have been mainly restricted to qualitative and quantitative analysis of samples material. Recently LIPS is applied in addition to depth-profile analysis. In this paper we were trying to investigate the differences in the depth profile, obtained adopting femtosecond LIPS, that may occur on changing the spectral lines chosen for the analysis. The used femtosecond laser has pulse duration of 130 fs, wave length of 795 nm and pulse energy 200 μJ. It was found that the differences observed were not significant as long as the spectral lines chosen are fulfilling the LIPS spectral lines conditions.
Additional details
Identifiers
- DOI
- 10.1063/1.3250126;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1172
- Journal Issue
- 1
- Journal Page Range
- p. 67-69
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 7. international conference on laser applications
- Acronym
- ICLA 2009
- Dates
- 17-21 May 2009
- Place
- Cairo (Egypt)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41064054
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABLATION; CHARGE-COUPLED DEVICES; CHEMICAL COMPOSITION; DEPTH; EMISSION SPECTROSCOPY; LASER RADIATION; LASER-PRODUCED PLASMA; MULTI-ELEMENT ANALYSIS; PULSED IRRADIATION; QUANTITATIVE CHEMICAL ANALYSIS; THIN FILMS
- Descriptors DEC
- CHEMICAL ANALYSIS; DIMENSIONS; ELECTROMAGNETIC RADIATION; FILMS; IRRADIATION; PLASMA; RADIATIONS; SEMICONDUCTOR DEVICES; SPECTROSCOPY
Optional Information
- Notes
- (c) 2009 American Institute of Physics