Thermal behavior of K2MSi3O9·H2O with the structure of umbite (M = Sn) and kostylevite (M = Pb) minerals
Description
K2MSi3O9·H2O (M = Sn, Pb) synthetic framework silicates are isotypical with umbite and kostylevite minerals, respectively. The silicate anion exhibits two structural types, one of which is an infinite chain polysilicate (umbite) and the other a cyclohexasilicate (kostylevite). The structural formulas may be written as K2Sn{uB, 1∞1}[3Si3O9]H2O and K4Pb2{uB, 1r}[Si6O18]2H2O. The thermal behavior of these compounds was determined by dynamic and isothermal thermogravimetry combined with powder X-ray diffraction between room temperature and 550 deg. C. The kostylevite-type compound presents a very rigid framework, the umbite-type structure being much more flexible. In both cases, the dehydration process takes place with a reduction in cell volume. Anhydrous tin silicate presents a monoclinic cell whose volume is almost invariant with temperature. K2PbSi3O9 is obtained as an amorphous material. The structural characteristics of these phases are related to their ion exchange properties
Additional details
Identifiers
- DOI
- 10.1016/j.tca.2004.04.023;
- PII
- S0040603104001674;
Publishing Information
- Journal Title
- Thermochimica Acta
- Journal Volume
- 423
- Journal Issue
- 1-2
- Journal Page Range
- p. 113-119
- ISSN
- 0040-6031
- CODEN
- THACAS
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36072975
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- DEHYDRATION; ION EXCHANGE; LEAD COMPOUNDS; MONOCLINIC LATTICES; POTASSIUM COMPOUNDS; SILICATES; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; THERMAL GRAVIMETRIC ANALYSIS; TIN COMPOUNDS; X-RAY DIFFRACTION
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CHEMICAL ANALYSIS; COHERENT SCATTERING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIFFRACTION; GRAVIMETRIC ANALYSIS; OXYGEN COMPOUNDS; QUANTITATIVE CHEMICAL ANALYSIS; SCATTERING; SILICON COMPOUNDS; TEMPERATURE RANGE; THERMAL ANALYSIS
Optional Information
- Copyright
- Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.