Published June 12, 1975
| Version v1
Patent
Open
Method and system for automatically correcting aberrations of a beam of charged particles
Description
The location of a beam of charged particles within a deflection field is determined by its orthogonal deflection voltages. With the location of the beam in the field, correction currents are supplied to a focus coil and to each of a pair of stigmator coils to correct for change of focal length and astigmatism due to the beam being deflected away from the center of its deflection field
Availability note (English)
MF available from INIS under the Report Number.Files
7248882.pdf
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Additional details
Additional titles
- Original title (Dutch)
- Inrichting voor het elimineren van aberraties van een bundel geladen deeltjes
Publishing Information
- Imprint Pagination
- 10 p.
- IPC:
- Int. Cl. H01j37/21.
- IPC
- Int. Cl. H01j37/21.
- Patent number
- NL patent document 7506983/A/
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 7248882
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Descriptors DEI
- BEAM OPTICS; BEAM SHAPING; CHARGED PARTICLES; FEEDBACK; FOCUSING; GEOMETRICAL ABERRATIONS
Optional Information
- Notes
- Priority 26 Jun 1974, USA; 13 figs.