Experimental investigations of silicon tetrafluoride decomposition in ECR discharge plasma
- 1. Institute of Applied Physics Russian Academy of Sciences, Uljanova st. 46, Nizhny Novgorod 603950 (Russian Federation)
- 2. Institute for Physics of Microstructures Russian Academy of Sciences, GSP-105, Nizhny Novgorod 603950 (Russian Federation)
Description
The results of first experiments on the investigation of plasma of electron cyclotron resonance (ECR) discharge, sustained by CW radiation of technological gyrotron with frequency 24 GHz are considered. The parameters of nitrogen plasma of ECR discharge in magnetic field up to 1 T were investigated by Langmuir probe in the pressure range 10-4-10-2 mbar under different values of microwave power. Depending on gas pressure and power of microwave radiation, the typical temperature and density of electrons could attain values of 1-5 eV and 1011-1012 cm-3, respectively. The prospects for using of ECR discharge for plasma chemical decomposition of silicon tetrafluoride (SiF4) have been experimentally demonstrated. Plasma was created from SiF4 and hydrogen (H2) gas mixture and heated by microwave radiation in ECR conditions. Using the method of mass-spectrometry analysis of the gas at the outlet from the reactor and the weighting method, the content of the resultants of SiF4 decomposition as a function of process parameters was investigated. It was shown that SiF4 decomposition degree strongly depends on the microwave power, gas pressure in the reactor, gas flow rates, and can attain the value of 50%. The possible applications of PECVD method based on ECR discharge for production of isotopically pure elements with high deposition rate are discussed.
Additional details
Identifiers
- DOI
- 10.1063/1.3599618;
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 82
- Journal Issue
- 6
- Journal Page Range
- p. 063503-063503.7
- ISSN
- 0034-6748
- CODEN
- RSINAK
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44021540
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; ELECTRON CYCLOTRON-RESONANCE; EV RANGE; GAS FLOW; GHZ RANGE 01-100; HYDROGEN; LANGMUIR PROBE; MAGNETIC FIELDS; MASS SPECTROSCOPY; MICROWAVE RADIATION; NITROGEN; PLASMA; SILICON FLUORIDES
- Descriptors DEC
- CHEMICAL COATING; CHEMICAL REACTIONS; CYCLOTRON RESONANCE; DEPOSITION; ELECTRIC PROBES; ELECTROMAGNETIC RADIATION; ELEMENTS; ENERGY RANGE; FLUID FLOW; FLUORIDES; FLUORINE COMPOUNDS; FREQUENCY RANGE; GHZ RANGE; HALIDES; HALOGEN COMPOUNDS; NONMETALS; PROBES; RADIATIONS; RESONANCE; SILICON COMPOUNDS; SILICON HALIDES; SPECTROSCOPY; SURFACE COATING
Optional Information
- Notes
- (c) 2011 American Institute of Physics