Published May 22, 1985 | Version v1
Patent Metadata-only

Procedure for the thin-layer processing by means of electron beams

Creators

Description

The invention has been directed at a procedure for the thin-layer processing by means of electron beams in particular for the production of thin-layer resistors. The aim is to achieve a high quality by a high structure density on the ceramic substrates. An electron beam with a diameter much smaller than the wastage breadth is applied. The electron beam is high-frequencily deflected transverse to the processing direction in order to secure the required wastage breadth

Availability note (English)

Available from BUCHEXPORT, DDR-7010 Leipzig.

Additional details

Additional titles

Original title (German)
Verfahren zur Duennschichtbearbeitung mit Elektronenstrahl

Publishing Information

Imprint Pagination
vp.
IPC:
Int. Cl. H01c 17/24.
IPC
Int. Cl. H01c 17/24.
Patent number
DD patent document 222723/A/

INIS

Country of Publication
German Democratic Republic
Country of Input or Organization
German Democratic Republic
INIS RN
17009088
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
CERAMICS; ELECTRON BEAMS; LAYERS; PHYSICAL RADIATION EFFECTS; QUALITY ASSURANCE; SEMICONDUCTOR RESISTORS; SUBSTRATES; SURFACE TREATMENTS; THICKNESS
Descriptors DEC
BEAMS; DIMENSIONS; ELECTRICAL EQUIPMENT; EQUIPMENT; LEPTON BEAMS; PARTICLE BEAMS; RADIATION EFFECTS; RESISTORS; SEMICONDUCTOR DEVICES