Published June 1, 1991
| Version v1
Journal article
Experimental and molecular-dynamics study of the Ar emission mechanism during low-energy Ar+ bombardment of Cu
- 1. Philips Research Laboratories, P.O. Box 80 000, 5600 JA Eindhoven (The Netherlands)
- 2. Department of Chemistry, The Pennsylvania State University, University Park, PA (USA)
Description
Angle-resolved time-of-flight distributions of Ar atoms emitted during Ar+ bombardment of Cu have been measured and compared to results of molecular-dynamics simulations. For keV incident energies, implanted Ar atoms escape peaked along the surface normal, due to a high excitation density of the surface, induced by a nearby Ar+ impact, and the negligible attraction between Ar and Cu. At low incident energies, the simulations show that the Ar is trapped for a short time in the first Cu layers, undergoes a few collisions and is emitted in a similar direction but at higher kinetic energy
Additional details
Publishing Information
- Journal Title
- Physical Review, B: Condensed Matter
- Journal Volume
- 43
- Journal Issue
- 16
- Series
- Phys. Rev., B: Condens. Matter.
- Journal Page Range
- 13695-13698
- ISSN
- 0163-1829
- CODEN
- PRBMD
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22074234
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANGULAR DISTRIBUTION; ARGON IONS; COLLISIONS; COPPER; ENERGY SPECTRA; ION COLLISIONS; MOLIERE THEORY; MULTIPLE SCATTERING; SPUTTERING; TIME-OF-FLIGHT METHOD
- Descriptors DEC
- CHARGED PARTICLES; DISTRIBUTION; ELEMENTS; IONS; METALS; SCATTERING; SPECTRA; TRANSITION ELEMENTS