Magnetoelastic properties of nanostructured FeCoSiB ribbons used for high-sensitive stress sensors
- 1. Department of Nano Magnetic Materials and Devices, Faculty of Engineering Physics and Nanotechnology, College of Technology, Vietnam National University, Hanoi E3 Building, 144 Xuan Thuy, Cau Giay, Hanoi (Viet Nam)
Description
High-sensitive stress sensor is simply constructed comprising magnetostrictive 30 μm-thick (Fe80Co20)78Si12B10 ribbon acting as a sensitive magnetic core inside an induction coil. The stress can be determined indirectly by measuring the change in the output voltage in the two-coil system. The results show that the sensitivity highly depends on the intrinsic properties of the ribbon cores. The optimum with both a high sensitivity and an almost linear stress dependence of output signal was obtained in the 250 C-annealed ribbon. This is attributed to the correlation between the magnetic and magnetoelastic softness governed by the fine 10 nm nanograin structure. These high sensitivity and simple fabrication sensors are widely applicable to various stress detecting fields. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssc.200777203Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi. C, Conferences
- Journal Volume
- 4
- Journal Issue
- 12
- Journal Page Range
- p. 4585-4588
- ISSN
- 1610-1634
Conference
- Title
- International symposium on advanced magnetic materials and applications (ISAMMA 2007)
- Dates
- 28 May - 1 Jun 2007
- Place
- Jeju (Korea, Republic of)
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 39024000
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; BORON ALLOYS; COBALT ALLOYS; FREQUENCY DEPENDENCE; IRON ALLOYS; KHZ RANGE 01-100; KHZ RANGE 100-1000; MAGNETOSTRICTION; NANOSTRUCTURES; OPTIMIZATION; QUATERNARY ALLOY SYSTEMS; SCANNING ELECTRON MICROSCOPY; SENSITIVITY; SILICON ALLOYS; STRESSES; TEMPERATURE RANGE 0400-1000 K; X-RAY DIFFRACTION
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; FREQUENCY RANGE; HEAT TREATMENTS; KHZ RANGE; MAGNETIC PROPERTIES; MICROSCOPY; PHYSICAL PROPERTIES; SCATTERING; TEMPERATURE RANGE; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- With 6 figs., 10 refs.. SICI: 1610-1634(200712)4:12<4585::AID-PSSC200777203>3.0.TX;2-D