Published 1991
| Version v1
Miscellaneous
Natural aging and annealing characteristics of sputter-deposited yttria
Description
The natural aging and annealing characteristics of cubic and amorphous yttria, sputter-deposited on fused silica, were studied. The experimental program consisted of determining and correlating changes in crystallography, microstructure, chemistry, and near-ultraviolet optical absorption resulting from annealing at 700 and 900C for times of up to 145.5 h. The results show that Si does not diffuse into the yttria film upon annealing. However, changes in film properties do occur and these changes are strongly dependent upon temperature and annealing atmosphere, air or argon. The results are discussed in terms of changes in Y-O bonding
Availability note (English)
University Microfilms, PO Box 1764, Ann Arbor, MI 48106, Order No.91-28,523.Additional details
Publishing Information
- Publisher
- Univ. of Wisconsin.
- Imprint Place
- Milwaukee, WI (United States)
- Imprint Pagination
- 95 p.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 24018458
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Thesis, Non-conventional Literature
- Descriptors DEI
- AGING; ANNEALING; CHEMICAL BONDS; DEPOSITION; DIFFUSION; FILMS; ION BEAMS; MICROSTRUCTURE; SILICON OXIDES; SURFACE COATING; TEMPERATURE RANGE 1000-4000 K; YTTRIUM OXIDES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CRYSTAL STRUCTURE; HEAT TREATMENTS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS; YTTRIUM COMPOUNDS