Published February 1997 | Version v1
Journal article

Direct observation of plasmon excitation in Si-SiO2 by γ-rays

  • 1. Xinjiang Petroleum College, Urumqi (China)
  • 2. Beijing Centre of Physical and Chemical Analysis, Beijing (China)

Description

The first level plasmons of Si (located at B.E.116.95 eV) and SiO2 (located at B.E.122.0 eV) in radiation hardened and non-hardened Si-SiO2 were investigated by XPS before and after 60Co irradiation. The experimental results indicate that the interface consisting of the two plasmons extends toward the surface of SiO2, and the centre of the interface moves toward the surface of SiO2 after the irradiation. The concentration of plasmons depends on radiation dose, irradiation bias field and the growth process of Si-SiO2

Additional details

Publishing Information

Journal Title
Nuclear Techniques
Journal Volume
20
Journal Issue
2
Journal Page Range
p. 91-94.
ISSN
0253-3219
CODEN
NUTEDL