Published January 15, 2000
| Version v1
Journal article
Silicon-induced nanostructure evolution of the GaAs(001) surface
- 1. Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, D-10117 Berlin (Germany)
Description
By using scanning tunneling microscopy and reflection high-energy electron diffraction it is demonstrated that self-organized ordered Si structures develop during submonolayer Si deposition on vicinal GaAs(001) surfaces, provided the preferred adsorption sites in the trenches of the (2x4) reconstruction are filled with Ga. The evolution of different reconstructions with increasing Si coverages is accompanied by step bunching and de-bunching processes. This unexpected behavior is explained by the interaction between reconstructions and steps from a thermodynamic equilibrium view. For particular coverages the complex process leads to a separation of different surface phases and Si coverages on terraces and in step regions
Additional details
Identifiers
- DOI
- 10.1103/PhysRevB.61.R2440;
- PII
- S0163-1829(00)51104-7;
Publishing Information
- Journal Title
- Physical Review. B, Condensed Matter and Materials Physics
- Journal Volume
- 61
- Journal Issue
- 4
- Journal Page Range
- p. R2440-R2443
- ISSN
- 1098-0121
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35071566
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADSORPTION; DEPOSITION; ELECTRON DIFFRACTION; EVOLUTION; GALLIUM ARSENIDES; NANOSTRUCTURES; REFLECTION; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACES
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; COHERENT SCATTERING; DIFFRACTION; ELEMENTS; GALLIUM COMPOUNDS; MICROSCOPY; PNICTIDES; SCATTERING; SEMIMETALS; SORPTION
Optional Information
- Notes
- (c) 2000 The American Physical Society