Published January 1980 | Version v1
Journal article

Modern methods for thin film and surface analyses

Creators

  • 1. Philips Gloeilampenfabrieken N.V., Eindhoven (Netherlands)

Description

The excitation and emission phenomena and the physical properties used for the identification of elements in modern methods of thin film and surface analysis (laser optical emission spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy (AES), electron microprobe analysis, scanning and transmission electron microscopy (SEM, TEM), low and high energy ion scattering spectroscopy and secondary ion mass spectrometry (SIMS)) are briefly discussed. Recent developments in and the state of the art of depth profiling (using both destructive and non-destructive methods) and microspot analysis are reviewed in depth. (Auth.)

Additional details

Publishing Information

Journal Title
Mater. Sci. Eng.
Journal Volume
42
Series
Mater. Sci. Eng.
Journal Page Range
1-12
ISSN
0025-5416

Conference

Title
International Chalmers Symposium on surface problems in materials science and technology.
Dates
11 - 13 Jun 1979.
Place
Goeteborg, Sweden.