Published January 1980
| Version v1
Journal article
Modern methods for thin film and surface analyses
Description
The excitation and emission phenomena and the physical properties used for the identification of elements in modern methods of thin film and surface analysis (laser optical emission spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy (AES), electron microprobe analysis, scanning and transmission electron microscopy (SEM, TEM), low and high energy ion scattering spectroscopy and secondary ion mass spectrometry (SIMS)) are briefly discussed. Recent developments in and the state of the art of depth profiling (using both destructive and non-destructive methods) and microspot analysis are reviewed in depth. (Auth.)
Additional details
Publishing Information
- Journal Title
- Mater. Sci. Eng.
- Journal Volume
- 42
- Series
- Mater. Sci. Eng.
- Journal Page Range
- 1-12
- ISSN
- 0025-5416
Conference
- Title
- International Chalmers Symposium on surface problems in materials science and technology.
- Dates
- 11 - 13 Jun 1979.
- Place
- Goeteborg, Sweden.
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- Switzerland
- INIS RN
- 11550267
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AUGER ELECTRON SPECTROSCOPY; DEPTH; ELECTRON MICROPROBE ANALYSIS; ELECTRON MICROSCOPY; FILMS; MASS SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; SECONDARY EMISSION; SPATIAL DISTRIBUTION; SURFACES
- Descriptors DEC
- CHEMICAL ANALYSIS; DIMENSIONS; DISTRIBUTION; ELECTRON SPECTROSCOPY; EMISSION; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; SPECTROSCOPY