High-resolution patterning of organic-inorganic photoresins for tungsten and tungsten carbide microstructures
Creators
- 1. Laboratory of Process Technology, NeptunLab, Department of Microsystems Engineering (IMTEK), University of Freiburg, Freiburg, 79110 (Germany)
- 2. Laboratory for MEMS Applications, Department of Microsystems Engineering (IMTEK), University of Freiburg, Freiburg, 79110 (Germany)
- 3. Department of Tribology, Fraunhofer Institute for Mechanics of Materials (IWM), Freiburg, 79108 (Germany)
- 4. Department of Component Safety and Lightweight Construction, Fraunhofer Institute for Mechanics of Materials (IWM), Freiburg, 79108 (Germany)
- 5. Freiburg Materials Research Center (FMF), University of Freiburg, Freiburg, 79104 (Germany)
- 6. Institute for Inorganic and Analytical Chemistry, University of Freiburg, Freiburg, 79104 (Germany)
- 7. FIT Freiburg Center of Interactive Materials and Bioinspired Technologies, University of Freiburg, Freiburg, 79110 (Germany)
Description
Tungsten is an important material for high-temperature applications due to its high chemical and thermal stability. Its carbide, that is, tungsten carbide, is used in tool manufacturing because of its outstanding hardness and as a catalyst scaffold due to its morphology and large surface area. However, microstructuring, especially high-resolution 3D microstructuring of both materials, is a complex and challenging process which suffers from slow speeds and requires expensive specialized equipment. Traditional subtractive machining methods, for example, milling, are often not feasible because of the hardness and brittleness of the materials. Commonly, tungsten and tungsten carbide are manufactured by powder metallurgy. However, these methods are very limited in the complexity and resolution of the produced components. Herein, tungsten ion-containing organic-inorganic photoresins, which are patterned by two-photon lithography (TPL) at micrometer resolution, are introduced. The printed structures are converted to tungsten or tungsten carbide by thermal debinding and reduction of the precursor or carbothermal reduction reaction, respectively. Using TPL, complex 3D tungsten and tungsten carbide structures are prepared with a resolution down to 2 and 7 µm, respectively. This new pathway of structuring tungsten and its carbide facilitates a broad range of applications from micromachining to metamaterials and catalysis. (© 2023 The Authors. Advanced Engineering Materials published by Wiley‐VCH GmbH)
Availability note (English)
Available from: http://dx.doi.org/10.1002/adem.202201927Additional details
Identifiers
Publishing Information
- Journal Title
- Advanced Engineering Materials
- Journal Volume
- 25
- Journal Issue
- 13
- Journal Page Range
- p. 1-11
- ISSN
- 1438-1656
- CODEN
- AENMFY
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 54079668
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- MANUFACTURING; MICROSTRUCTURE; PHOTONS; POLYMERIZATION; PRECURSOR; REDUCTION; RESINS; SCREEN PRINTING; TUNGSTEN; TUNGSTEN CARBIDES
- Descriptors DEC
- BOSONS; CARBIDES; CARBON COMPOUNDS; CHEMICAL REACTIONS; DEPOSITION; ELEMENTARY PARTICLES; ELEMENTS; MASSLESS PARTICLES; METALS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; PETROCHEMICALS; PETROLEUM PRODUCTS; POLYMERS; REFRACTORY METAL COMPOUNDS; REFRACTORY METALS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TUNGSTEN COMPOUNDS
Optional Information
- Notes
- AID: 2201927