Published May 2007 | Version v1
Journal article

Electron impact collision strengths in Si IX, Si X, and Si XI

  • 1. National Astronomical Observatories, Chinese Academy of Sciences, Beijing 100012 (China)
  • 2. Department of Applied Physics, National University of Defense Technology, Changsha 410073 (China)

Description

Electron impact collision strengths among 560 levels of Si IX, 320 levels of Si X, and 350 levels of Si XI have been calculated using the Flexible Atomic Code of Gu [M.F. Gu, Astrophys. J. 582 (2003) 1241]. Collision strengths Ω at 10 scattered electron energies, namely 10, 50, 100, 200, 400, 600, 800, 1000, 1500, and 2000 eV, are reported. Assuming a Maxwellian energy distribution, effective collision strengths Y are obtained on a finer electron temperature grid of 0.5, 1.0, 2.0, 3.0, 4.0, 5.0, and 6.0 MK, which covers the typical temperature range of astrophysical hot plasmas. Additionally, radiative rates A and weighted oscillator strengths gf are given for the more probable transitions among these levels. Comparisons of our results with available predictions reported in earlier literature are made and the accuracy of the data is assessed. Most transitions exhibit a good agreement, but large differences in gf appear for a few cases, which are due to the different configuration interactions included in different theoretical calculations. For excitations among levels of the ground and lower excited configurations, large discrepancies of Y may have resulted from the consideration of resonance effects in earlier works

Additional details

Identifiers

DOI
10.1016/j.adt.2006.12.001;
arXiv
arXiv:physics/0608111v1;
PII
S0092-640X(06)00075-1;

Publishing Information

Journal Title
Atomic Data and Nuclear Data Tables
Journal Volume
93
Journal Issue
3
Journal Page Range
p. 375-536
ISSN
0092-640X
CODEN
ADNDAT

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.