Removal of nickel and cobalt ions from aqueous solutions using electron-beam treatment
Creators
- 1. Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University, 115 19 Prague 1 (Czech Republic)
- 2. Centre for Radiochemistry and Radiation Chemistry, Czech Technical University, 115 19 Prague 1 (Czech Republic)
Description
Radiation removal of Co2+ and Ni2+ ions from aqueous solutions containing Me2+ and various scavengers for OH radicals has been studied. In nondeaerated solutions containing HCOOK as OH radical scavenger, two mechanisms of removal were found: reduction leading to the insoluble colloidal metals and precipitation causing predominant formation of carbonate. The processes taking place are mainly affected by the concentration of formate scavenger and depend on the type of metal ions in solution. In the presence of aliphatic alcohols as OH radical scavengers at pH in the interval 6-8, the radiation treatment leads to the metallic product. The efficiency of reduction depends on the rate constant for the reaction of Me+ intermediate with corresponding alcohol radical
Availability note (English)
Available from http://dx.doi.org/10.1016/j.radphyschem.2008.03.005Additional details
Identifiers
- DOI
- 10.1016/j.radphyschem.2008.03.005;
- PII
- S0969-806X(08)00053-4;
Publishing Information
- Journal Title
- Radiation Physics and Chemistry (1993)
- Journal Volume
- 77
- Journal Issue
- 8
- Journal Page Range
- p. 968-973
- ISSN
- 0969-806X
- CODEN
- RPCHDM
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40001598
- Subject category
- S38: RADIATION CHEMISTRY, RADIOCHEMISTRY AND NUCLEAR CHEMISTRY;
- Descriptors DEI
- ALCOHOLS; AQUEOUS SOLUTIONS; COBALT IONS; ELECTRON BEAMS; FORMATES; HYDROXYL RADICALS; NICKEL IONS; PH VALUE; PRECIPITATION; REACTION KINETICS
- Descriptors DEC
- BEAMS; CARBOXYLIC ACID SALTS; CHARGED PARTICLES; DISPERSIONS; HOMOGENEOUS MIXTURES; HYDROXY COMPOUNDS; IONS; KINETICS; LEPTON BEAMS; MIXTURES; ORGANIC COMPOUNDS; PARTICLE BEAMS; RADICALS; SEPARATION PROCESSES; SOLUTIONS
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.