Published January 22, 2009
| Version v1
Journal article
Contrast of Subpicosecond Microelectron Bunch Trains
Creators
- 1. University of Southern California, Los Angeles, CA 90089 (United States)
- 2. Brookhaven National Laboratory, Upton, NY 11973 (United States)
Description
We recently demonstrated that electron bunch trains with a controllable number of bunches and adjustable subpicosecond spacing can be produced using a mask technique. In this paper we calculate the bunch train contrast as a function of the beam betatron size at the mask σβ and of the diameter d of the mask wires separated by a period D. As expected, when σβ/(d/2) the contrast is high and decreases with increasing σβ/(d/2).
Additional details
Identifiers
- DOI
- 10.1063/1.3080990;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1086
- Journal Issue
- 1
- Journal Page Range
- p. 683-688
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 13. advanced accelerator concepts workshop
- Dates
- 27 Jul - 2 Aug 2008
- Place
- Santa Cruz, CA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41005894
- Subject category
- S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM BUNCHING; BETATRONS; ELECTRONS; FREE ELECTRON LASERS; PARTICLE BEAMS; WAKEFIELD ACCELERATORS
- Descriptors DEC
- ACCELERATORS; BEAM DYNAMICS; BEAMS; CYCLIC ACCELERATORS; DYNAMICS; ELEMENTARY PARTICLES; FERMIONS; LASERS; LEPTONS; LINEAR ACCELERATORS; MECHANICS
Optional Information
- Notes
- (c) 2009 American Institute of Physics