Metallo-organic solution deposition (MOSD) of transparent, crystalline ferroelectric films

This patent describes an improved coating deposition process for transparent, ferroelectric films up to 5 mm thick. It comprises: mixing liquid state metallo-organic starting materials consisting of at least one alkoxide or carboxylic acid salt of the metals selected from a group consisting of barium, strontium, lead, lanthanum or lithium or a from a group consisting of zirconium, titanium or niobium to form a coating solution; spinning, dipping, or spraying the coating solution on the substrate to be coated; drying the coated substance at low temperature in the range of 100-200 degrees C. in air or a vacuum, thereby removing low boiling solvent molecules; rapidly densifying the coated substrate at moderate temperature (400-600 degrees C.), thereby forming an amorphous film; repeating the above steps until a desired coating thickness is obtained; and annealing the thus formed film at a temperature in the range 525-800 degrees C. to obtain a transparent ferroelectric oxide film with a controlled grain size