Published April 1977 | Version v1
Journal article

Photoreactivation of conversion and de novo suppressor mutation in Escherichia coli

  • 1. Indiana Univ., Indianapolis (USA). Dept. of Microbiology

Description

Studies of mutagenesis and photoreactivation in various E.coli strains have shown that conversion mutation of a mutant containing an amber suppressor to one containing an ochre suppressor is sensitive to photoreactivation. Direct photoreactivation by photoreactivating light (PRL) after UV mutagenesis reduced mutation frequencies by a factor of about 2 for each minute of exposure during the first 5 to 8 min of exposure for cells with normal repair capacity. Conversion and potential de novo suppressor mutations were about equally sensitive. For conversion, the sensitivities to PRL were identical in the repair-normal and excisions-repair-deficient strains. For de novo suppressor mutation, the rate of mutation frequency reduction by PRL in the repair-deficient strain was about one-half that in the other strains. The results suggest that ultraviolet radiation produces both de novo suppressor mutation and conversion at the sup(E,B) locus by photoreversible pyrimidine dimers in the DNA. The causative dimers could be Thy[]Cyt dimers in the transcribed strand or the non-transcribed strand, respectively. (U.K.)

Additional details

Publishing Information

Journal Title
Photochemistry and Photobiology
Journal Volume
25
Journal Issue
4
Series
Photochem. Photobiol.
Journal Page Range
397-398
ISSN
0031-8655

Optional Information

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