Published July 20, 2006 | Version v1
Journal article

Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films

  • 1. Unesp-Sao Paulo State University, Instituto de Quimica C.P. 355, 14801-970 Araraquara, SP (Brazil)
  • 2. Departamento de Fisica, PUC-Rio, Rua Marques de Sao Vicente, 225, 22453-900 Rio de Janeiro, RJ (Brazil)

Description

Strong interest in developing technology for visual information stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc oxide films are suitable for electroluminescence applications. Two different devices were assembled as ITO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (5D4→7F6), 543 nm (5D4→7F5), and 589 nm (5D4→7F4), or from Tm3+ at 478 nm (1G4→3H6), and 511 nm (1D2→3H5) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed

Additional details

Identifiers

DOI
10.1016/j.jallcom.2005.10.066;
PII
S0925-8388(05)01687-7;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
418
Journal Issue
1-2
Journal Page Range
p. 35-38
ISSN
0925-8388
CODEN
JALCEU

Conference

Title
24. rare earth research conference
Dates
26-30 Jun 2005
Place
Keystone, CO (United States)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.