Published August 2005 | Version v1
Journal article Metadata-only

Thermionic vacuum arc - new technique for high purity carbon thin film deposition

Creators

  • 1. National Institute for Physics of Laser, Plasma and Radiation, Bucharest-Magurele (Romania)
  • 2. Department of Physics, 'Ovidius University', Constanta (Romania)
  • 3. Department of Physics, University of Essen, Essen (Germany)

Description

New technology for carbon film deposition is presented. The carbon film is condensing from carbon plasma generated by a thermionic vacuum arc with carbon anode. Carbon film is bombarded during deposition by energetic carbon ions at fixed energy. High purity, hydrogen free and nanostructured layers are obtained the characteristic size of structures being in the order of few nanometers (Authors)

Additional details

Publishing Information

Journal Title
Acta Physica Slovaca
Journal Volume
55
Journal Issue
4
Journal Page Range
p. 417-421
ISSN
0323-0465
CODEN
APSVCO

INIS

Country of Publication
Slovakia
Country of Input or Organization
Slovakia
INIS RN
36086729
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
CARBON IONS; GRAIN SIZE; HIGH-PURITY GE DETECTORS; PUREX PROCESS; RAMAN SPECTRA; RICHARDSON EQUATION; STAINLESS STEELS; SUBSTRATES; THIN FILMS
Descriptors DEC
ALLOYS; CARBON ADDITIONS; CHARGED PARTICLES; EQUATIONS; FILMS; GE SEMICONDUCTOR DETECTORS; HIGH ALLOY STEELS; IONS; IRON ALLOYS; IRON BASE ALLOYS; MEASURING INSTRUMENTS; MICROSTRUCTURE; RADIATION DETECTORS; REPROCESSING; SEMICONDUCTOR DETECTORS; SEPARATION PROCESSES; SIZE; SPECTRA; STEELS; TRANSITION ELEMENT ALLOYS

Optional Information

Notes
6 refs., 5 figs., 2 tabs.