Published February 2016 | Version v1
Journal article

Optical sensitivity non-uniformity analysis and optimization of a tilt optical readout focal plane array

  • 1. Smart Sensing Research and Development Centre, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029 (China)
  • 2. China Academy of Space Technology, Beijing 100094 (China)
  • 3. Chinese Academy of Sciences Key Laboratory of Mechanical Behavior and Design of Materials, University of Science and Technology of China, Hefei 230027 (China)

Description

An optical readout focal plane array (FPA) usually has a differently tilted reflector/absorber at the initial state due to the micromachining technique. The angular deviation of the reflector/absorber has a strong impact on the optical sensitivity non-uniformity, which is a key factor which affects the imaging uniformity. In this study, a theoretical analysis has been developed, and it is found that the stress matching in SiO2-Aluminum (Al) bilayer leg could make a contribution towards reducing the optical sensitivity non-uniformity. Ion implantation of phosphorus (P) has been utilized to control the stress in SiO2 film. By controlling the implantation energy and dose, the stress and stress stability are modified. The optical readout FPA has been successfully fabricated with the stress-control technique based on P+ implantation. It is demonstrated that the gray response non-uniformity of optical readout FPA has decreased from 25.69% to 10.7%. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0960-1317/26/2/025001

Additional details

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering. Structures, Devices and Systems
Journal Volume
26
Journal Issue
2
Journal Page Range
[10 p.]
ISSN
0960-1317
CODEN
JMMIEZ

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47079470
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ALUMINIUM; CONTROL; FILMS; LAYERS; MACHINING; OPTIMIZATION; PHOSPHORUS; PHOSPHORUS IONS; READOUT SYSTEMS; SENSITIVITY; SILICA; SILICON OXIDES; STRESSES
Descriptors DEC
CHALCOGENIDES; CHARGED PARTICLES; ELEMENTS; IONS; METALS; MINERALS; NONMETALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS