Published March 2007
| Version v1
Journal article
Effect of sputtering gas (Ne, Ar, Kr) on the properties of L10 FePt films
Creators
- 1. Shinshu University, 4-17-1Wakasato, Nagano 380-8553 (Japan)
Description
FePt films were prepared by RF sputtering using Ne, Ar, and Kr as sputtering gas. The effects of sputtering gas on the microstructure and magnetic properties were studied. Both magnetic and crystallographic properties show that Kr gas promotes the formation of L10 phase. The films prepared by using Ar and Ne gas have random orientation, whereas the films prepared by using Kr gas show preferential c-axis perpendicular to the film plane orientation
Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2006.10.957;
- PII
- S0304-8853(06)02168-8;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 310
- Journal Issue
- 2
- Journal Page Range
- p. e916-e917
- ISSN
- 0304-8853
- CODEN
- JMMMDC
Conference
- Title
- 17. international conference on magnetism
- Dates
- 20-25 Aug 2006
- Place
- Kyoto (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39026999
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; CRYSTALLOGRAPHY; IRON ALLOYS; KRYPTON; MAGNETIC PROPERTIES; MICROSTRUCTURE; NEON; ORIENTATION; PLATINUM ALLOYS; RARE EARTH ALLOYS; SPUTTERING; THIN FILMS
- Descriptors DEC
- ALLOYS; ELEMENTS; FILMS; FLUIDS; GASES; NONMETALS; PHYSICAL PROPERTIES; PLATINUM METAL ALLOYS; RARE GASES; TRANSITION ELEMENT ALLOYS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.