Ti-Al-Si-C-N hard coatings synthesized by hybrid arc enhanced magnetron sputtering
Creators
- 1. State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University (China)
- 2. ICMMO/LEMHE, Universite Paris-Sud 11, Orsay Cedex (France)
- 3. Department of Physics and Materials Science, City University of Hong Kong (China)
Description
Ti-Al-Si-C-N coatings are deposited by hybrid arc-enhanced magnetic sputtering and characterized by various micro- and macro-tools. X-ray diffraction, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy reveal that the coatings are nanocomposites consisting of nanocrystallites and amorphous phases. They are generally in the form of nc-(Ti,Al)(C,N)/a-Si3N4/a-C depending on the composition of the coatings. With increasing Al concentrations, the X-ray diffraction peaks shift to a lower angle indicating compressive stress in the coatings. The measured hardness also diminishes implying reduced contributions from the self-organized stable nanostructure. The dry friction coefficients of the Ti-Al-Si-C-N coatings are found to be about 0.3 which is lower than that of conventional Ti-Si-N coatings. These coatings can find potential applications requiring high temperature with heavy contact loading. (author)
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48018596.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 10 p.
- Report number
- INIS-BR--17018
Conference
- Title
- international federation for heat treatment and surface engineering; 1. TMS/ABM international materials congress 2010
- Acronym
- 65. ABM international congress; 18. IFHTSE congress
- Dates
- 26-30 Jul 2010
- Place
- Rio de Janeiro, RJ (Brazil)
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 48018596
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM COMPOUNDS; COATINGS; DEPOSITION; FRICTION; HARDNESS; MAGNETRONS; NANOSTRUCTURES; SILICON COMPOUNDS; SPUTTERING; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MECHANICAL PROPERTIES; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PHOTOELECTRON SPECTROSCOPY; SCATTERING; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS