Published 2000
| Version v1
Book
Ion-Induced Radical Desorption in High-Density Plasma and Application to Wall Control of Oxide Etcher
Creators
- 1. Department of Electrical Engineering, Nagoya University, Nagoya (Japan)
Description
no abstract available
Additional details
Publishing Information
- Publisher
- Printing Division, Space Research Center, Polish Academy of Sciences, Warsaw, Poland
- Imprint Place
- Warsaw (Poland)
- ISBN
- 83-902319-5-6
- Imprint Title
- 24 International Conference on Phenomena in Ionized Gases Proceedings - Vol. 1
- Imprint Pagination
- 260 p.
- Journal Page Range
- p. 65-66
Conference
- Title
- 24 International Conference on Phenomena in Ionized Gases
- Dates
- 11-16 Jul 1999
- Place
- Warsaw (Poland)
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 33059825
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- ANTENNAS; ARGON; CARBON FLUORIDES; DESORPTION; ELECTRON DENSITY; FLUORINE; GAS FLOW; HIGH-FREQUENCY DISCHARGES; LABORATORY EQUIPMENT; MASS SPECTROSCOPY; PLASMA; PLASMA DIAGNOSTICS; PLASMA POTENTIAL; RADICALS; WALL EFFECTS
- Descriptors DEC
- CARBON COMPOUNDS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRICAL EQUIPMENT; ELEMENTS; EQUIPMENT; FLUID FLOW; FLUIDS; FLUORIDES; FLUORINE COMPOUNDS; GASES; HALIDES; HALOGEN COMPOUNDS; HALOGENS; NONMETALS; RARE GASES; SORPTION; SPECTROSCOPY
Optional Information
- Notes
- 5 refs, 3 figs
- Funding organization
- MInistry of Education, Science, Sport and Culture (Japan)