Published June 15, 2013 | Version v1
Journal article

Processing of enriched elemental boron (10B ∼ 65 at. %)

  • 1. Chemistry Group, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102 (India)
  • 2. Dept. of Materials Engineering, Indian Institute of Science, Bangalore 560 012 (India)

Description

Procedures were developed for purification and processing of electrodeposited enriched boron powder for control rod application in India's first commercial Proto Type Fast Breeder Reactor (PFBR). Methodology for removal of anionic (F−, Cl−, BF4−) and cationic (Fe2+, Fe3+, Ni2+) impurities was developed. Parameters for grinding boron flakes obtained after electrodeposition were optimized to obtain the boron powder having particle size less than 100 μm. The rate of removal of impurities was studied with respect to time and concentration of the reagents used for purification. Process parameters for grinding and removal of impurities were optimized. A flowsheet was proposed which helps in minimizing the purification time and concentration of the reagent used for the effective removal of impurities. The purification methodology developed in this work could produce boron that meets the technical specifications for control rod application in a fast reactor. - Highlights: • Purification of enriched electrodeposited boron. • Water leaching to remove anionic impurities. • Acid leaching to remove cationic impurities. • Optimization of processing parameters. • Flowsheet for the purification of boron

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2013.03.046

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2013.03.046;
PII
S0254-0584(13)00270-8;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
140
Journal Issue
1
Journal Page Range
p. 335-342
ISSN
0254-0584
CODEN
MCHPDR

INIS

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.