Published April 15, 1991 | Version v1
Journal article

Magnetic and structural properties of permalloy-tantalum multilayer thin films

  • 1. Department of Electrical Engineering, University of Manchester, Manchester M13 9PL, United Kingdom (UK)
  • 2. Institute of Electronics, Academia Sinica, Beijing, (China)
  • 3. Department of Electrical Engineering, University of Manchester, Manchester M13 9PL, (United Kingdom)

Description

This work describes a detailed investigation into the magnetic and structural properties of permalloy-tantalum multilayered thin films produced by vacuum evaporation. Their microstructure was investigated using high-resolution TEM and the magnetic properties were measured with vibrating-sample and vibrating-reed magnetometers. The results show a reduction in coercivity for the multilayer films which is independent of the number of layers but depends strongly on the magnetic layer thickness. The tantalum layer is shown to be continuous and microcrystalline down to 25-A thickness, but the interface between the layers is irregular and may give rise to additional magnetostatic coupling as the tantalum layer thickness is reduced

Additional details

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
69
Journal Issue
8
Series
J. Appl. Phys.
Journal Page Range
4526-4528
ISSN
0021-8979
CODEN
JAPIA

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
22075822
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ANISOTROPY; COERCIVE FORCE; MAGNETIC PROPERTIES; MICROSTRUCTURE; PERMALLOY; TANTALUM; THIN FILMS
Descriptors DEC
ALLOYS; CRYSTAL STRUCTURE; ELEMENTS; FILMS; METALS; PHYSICAL PROPERTIES; TRANSITION ELEMENTS