Published April 15, 1991
| Version v1
Journal article
Magnetic and structural properties of permalloy-tantalum multilayer thin films
Creators
- 1. Department of Electrical Engineering, University of Manchester, Manchester M13 9PL, United Kingdom (UK)
- 2. Institute of Electronics, Academia Sinica, Beijing, (China)
- 3. Department of Electrical Engineering, University of Manchester, Manchester M13 9PL, (United Kingdom)
Description
This work describes a detailed investigation into the magnetic and structural properties of permalloy-tantalum multilayered thin films produced by vacuum evaporation. Their microstructure was investigated using high-resolution TEM and the magnetic properties were measured with vibrating-sample and vibrating-reed magnetometers. The results show a reduction in coercivity for the multilayer films which is independent of the number of layers but depends strongly on the magnetic layer thickness. The tantalum layer is shown to be continuous and microcrystalline down to 25-A thickness, but the interface between the layers is irregular and may give rise to additional magnetostatic coupling as the tantalum layer thickness is reduced
Additional details
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 69
- Journal Issue
- 8
- Series
- J. Appl. Phys.
- Journal Page Range
- 4526-4528
- ISSN
- 0021-8979
- CODEN
- JAPIA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22075822
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANISOTROPY; COERCIVE FORCE; MAGNETIC PROPERTIES; MICROSTRUCTURE; PERMALLOY; TANTALUM; THIN FILMS
- Descriptors DEC
- ALLOYS; CRYSTAL STRUCTURE; ELEMENTS; FILMS; METALS; PHYSICAL PROPERTIES; TRANSITION ELEMENTS