Published April 30, 2009 | Version v1
Journal article

Surface modification of high aspect ratio structures with fluoropolymer coatings using chemical vapor deposition

  • 1. Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Room 66-419, Cambridge, Massachusetts 02139 (United States)

Description

Initiated chemical vapor deposition (iCVD) was used to coat the internal surfaces of high aspect ratio capillary pore membranes and silicon trenches with poly(1H,1H,2H,2H-perfluorodecyl acrylate) (PPFDA). The presence of the fluoropolymer coating along the pore walls of the membranes was confirmed using X-ray photoelectron microscopy, electron microprobe analysis, and contact angle measurements. The results of this study demonstrate that the iCVD process can be used to conformally coat high aspect ratio microstructures (up to 80:1) with organic polymers.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2009.01.037

Additional details

Identifiers

DOI
10.1016/j.tsf.2009.01.037;
PII
S0040-6090(09)00098-4;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
517
Journal Issue
12
Journal Page Range
p. 3547-3550
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
5. international conference on hot-wire CVD (Cat-CVD) process
Dates
20-24 Aug 2008
Place
Cambridge, MA (United States)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.