Review of highly charged heavy ion production with electron cyclotron resonance ion source (invited)
Creators
- 1. Nishina Center for Accelerator-Based Science, RIKEN, Hirosawa 2-1, Wako, Saitama 351-0198 (Japan)
Description
The electron cyclotron resonance ion source (ECRIS) plays an important role in the advancement of heavy ion accelerators and other ion beam applications worldwide, thanks to its remarkable ability to produce a great variety of intense highly charged heavy ion beams. Great efforts over the past decade have led to significant ECRIS performance improvements in both the beam intensity and quality. A number of high-performance ECRISs have been built and are in daily operation or are under construction to meet the continuously increasing demand. In addition, comprehension of the detailed and complex physical processes in high-charge-state ECR plasmas has been enhanced experimentally and theoretically. This review covers and discusses the key components, leading-edge developments, and enhanced ECRIS performance in the production of highly charged heavy ion beams
Additional details
Identifiers
- DOI
- 10.1063/1.4842315;
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 85
- Journal Issue
- 2
- Journal Page Range
- vp.
- ISSN
- 0034-6748
- CODEN
- RSINAK
Conference
- Title
- 14. international conference on ion sources
- Acronym
- ICIS 2011
- Dates
- 12-16 Sep 2011
- Place
- Giardini-Naxos, Sicily (Italy)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45074963
- Subject category
- S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHARGE STATES; ECR ION SOURCES; ELECTRON CYCLOTRON-RESONANCE; HEAVY ION ACCELERATORS; HEAVY IONS; ION BEAMS; PERFORMANCE; REVIEWS
- Descriptors DEC
- ACCELERATORS; BEAMS; CHARGED PARTICLES; CYCLOTRON RESONANCE; DOCUMENT TYPES; ION SOURCES; IONS; RESONANCE
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC