Effect of annealing upon the structure and adhesion properties of sputtered bio-glass/titanium coatings
- 1. National Institute of Materials Physics, P.O. Box MG-7, Bucharest-Magurele, Ilfov 077125 (Romania)
- 2. Politehnica University of Bucharest, Faculty of Materials Science and Engineering, Bucharest (Romania)
- 3. University of Lille, Laboratory of Metallurgy, Villeneuve d'Ascq (France)
Description
Bio-glass films were deposited by radio-frequency magnetron sputtering technique onto medical grade Ti6Al7Nb alloy substrates from prepared silica based bio-glass target. A low deposition temperature was used (150 deg. C) and three different working pressures, followed by annealing in air at 550 and 750 deg. C. A quasi-stoichiometric target to substrate atomic transfer was found for Si, Ca and P, along with strong enrichment in Na and depletion in K and Mg, as evidenced by the energy dispersive microanalysis. The best results, taking into account stoichiometry and surface roughness, were obtained for the BG layers deposited at 0.3 Pa argon working pressure. The infrared spectroscopy of the as-sputtered and of the annealed films evidenced the characteristic molecular vibrations of silicate, phosphate and carbonate functional groups. The as-deposited films are amorphous and became partly crystalline after annealing at 750 deg. C, as evidenced by X-ray diffraction. The pull-out measurements, performed with a certified pull-test machine, gave very strong film-substrate adhesion strength values. For the non-crystalline layers, the pull-out strength is higher than 85 MPa, and decreases after annealing at 750 deg. C to 72.9 ± 7.1 MPa. The main objective of this work was to establish the influence of the working pressure upon the composition and morphology of the as-deposited films, and of the annealing temperature upon structure and film-substrate adhesion.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2009.06.117Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2009.06.117;
- PII
- S0169-4332(09)00960-X;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 255
- Journal Issue
- 22
- Journal Page Range
- p. 9132-9138
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44017779
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; ADHESION; ALUMINIUM COMPOUNDS; ANNEALING; COATINGS; FILMS; GLASS; INFRARED SPECTRA; LAYERS; MICROANALYSIS; NIOBIUM COMPOUNDS; PRESSURE RANGE MEGA PA 10-100; SILICA; STOICHIOMETRY; SUBSTRATES; SURFACES; TERNARY ALLOY SYSTEMS; TITANIUM COMPOUNDS; X-RAY DIFFRACTION
- Descriptors DEC
- ALLOY SYSTEMS; COHERENT SCATTERING; DIFFRACTION; HEAT TREATMENTS; MINERALS; OXIDE MINERALS; PRESSURE RANGE; PRESSURE RANGE MEGA PA; REFRACTORY METAL COMPOUNDS; SCATTERING; SPECTRA; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.