Published April 1, 2006 | Version v1
Journal article

Defect engineering for 650 nm high-power AlGaInP laser diodes

  • 1. Department of Electronics Engineering, Korea University, 1-5 ka, Anam-dong, Sungbuk-gu, Seoul 136-701 (Korea, Republic of)
  • 2. Discrete Semiconductor Device Division, Samsung Electro-Mechanic R and D Center, Suwon 443-803 (Korea, Republic of)
  • 3. Photonics Laboratory, Samsung Advanced Institute of Technology, Suwon 440-600 (Korea, Republic of)

Description

To find the optimal growth and annealing conditions for high-power 650 nm band AlGaInP laser diodes, we carried out defect engineering, in which the distribution and density of deep level defects of the laser structure was analyzed. For this purpose, deep level transient spectroscopy (DLTS) measurements were carried out for each layer of the 650 nm band AlGaInP laser. By layer optimization at growth and annealing conditions, the laser diode was able operate stably and kink-free at high power over 220 mW at 70 deg. C. The characteristic temperatures (T ) were 212 K for 25-60 deg. C and 106 K over 60 deg. C

Additional details

Identifiers

DOI
10.1016/j.physb.2005.12.154;
PII
S0921-4526(05)01542-5;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
376-377
Journal Page Range
p. 610-613
ISSN
0921-4526
CODEN
PHYBE3

Conference

Title
23. international conference on defects in semiconductors
Dates
24-29 Jul 2005
Place
Awaji Island (Japan)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.