Published September 2009
| Version v1
Journal article
High-performance electroabsorption modulator
- 1. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)
Description
A 100-μm-long electroabsorption modulator monolithically integrated with passive waveguides at the input and output ports is fabricated through ion implantation induced quantum well intermixing, using only a two-step low-pressure metal-organic vapor phase epitaxial process. An InGaAsP/InGaAsP intra-step quantum well is introduced to the active region to improve the modulation properties. In the experiment high modulation speed and high extinction ratio are obtained simultaneously, the electrical-to-optical frequency response (E/O response) without any load termination reaches to 22 GHz, and extinction ration is as high as 16 dB.
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/30/9/094008Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 30
- Journal Issue
- 9
- Journal Page Range
- [4 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42068437
- Subject category
- S43: PARTICLE ACCELERATORS; S36: MATERIALS SCIENCE;
- Descriptors DEI
- ION IMPLANTATION; MODULATION; PERFORMANCE; QUANTUM WELLS; VAPOR PHASE EPITAXY; WAVEGUIDES
- Descriptors DEC
- CRYSTAL GROWTH METHODS; EPITAXY; NANOSTRUCTURES