Published September 2009 | Version v1
Journal article

High-performance electroabsorption modulator

  • 1. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

A 100-μm-long electroabsorption modulator monolithically integrated with passive waveguides at the input and output ports is fabricated through ion implantation induced quantum well intermixing, using only a two-step low-pressure metal-organic vapor phase epitaxial process. An InGaAsP/InGaAsP intra-step quantum well is introduced to the active region to improve the modulation properties. In the experiment high modulation speed and high extinction ratio are obtained simultaneously, the electrical-to-optical frequency response (E/O response) without any load termination reaches to 22 GHz, and extinction ration is as high as 16 dB.

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/30/9/094008

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
30
Journal Issue
9
Journal Page Range
[4 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42068437
Subject category
S43: PARTICLE ACCELERATORS; S36: MATERIALS SCIENCE;
Descriptors DEI
ION IMPLANTATION; MODULATION; PERFORMANCE; QUANTUM WELLS; VAPOR PHASE EPITAXY; WAVEGUIDES
Descriptors DEC
CRYSTAL GROWTH METHODS; EPITAXY; NANOSTRUCTURES