Structure and superconducting properties of Nb-Zr alloy films made by a high-rate sputtering

Superconducting Nb-Zr alloy films have been prepared by a continuous high-rate sputtering on tantalum substrates. A deposition rate of 330 nm/min has been attained. The compositional profile in the Nb-Zr film is quite uniform and the film has nearly the same composition as that of the target. The films deposited in a pure argon atmosphere show a columnar structure grown perpendicular to the substrate. The grain size strongly depends on the substrate temperature. The phase transformations in the Nb-Zr film become more apparent and the structure becomes closer to the equilibrium state as the film is deposited in higher atmosphere pressures and/or at lower target voltages. The superconducting transition temperature T sub(c) of the films is about the same as that of bulk samples. The dependence of T sub(c) on the substrate temperature is explainable on the phase transformations in the film. Critical current density J sub(c) and its anisotropy is closely related to the grain structure of the film. Grain boundaries seem to act as the most predominant flux pinning centers in the films. Effects of oxygen in the sputtering atmosphere on the structure and superconducting properties of the Nb-Zr films have been also investigated. Oxygen significantly decreases the grain size of the film. Oxygen increases J sub(c) but decreases T sub(c) of the film. (auth.)