MBE growth of cubic AlxIn1-xN and AlxGayIn1-x-yN lattice matched to GaN
Creators
- 1. University of Paderborn, Department of Physics, Warburger Str. 100, 33095 Paderborn (Germany)
- 2. Leibniz-Institut fuer Oberflaechenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany)
- 3. Universitaet Leipzig, Institut fuer Experimentelle Physik II, Linnestr. 5, 04103 Leipzig (Germany)
Description
Ternary and quaternary cubic c-AlxIn1-xN/GaN and c-AlxGayIn1-x-yN/GaN heterostructures lattice-matched to c-GaN on freestanding 3C-SiC substrates were grown by plasma-assisted molecular beam epitaxy. The c-AlxGayIn1-x-yN alloy permits the independent control of band gap and lattice parameter. The ternary and quaternary films were grown at 620 C. Different alloy compositions were obtained by varying the Al and Ga fluxes. The alloy composition was measured by Energy Dispersive X-ray Spectroscopy (EDX) and Rutherford Backscattering Spectrometry (RBS). X-ray reciprocal space map of asymmetric (-1-13) reflex were used to measure the lattice parameters and to verify the lattice match between the alloy and the c-GaN buffer. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssc.200674915Additional details
Identifiers
- DOI
- 10.1002/pssc.200674915;
- arXiv
- arXiv:cond-mat/0702363v1;
Publishing Information
- Journal Title
- Physica Status Solidi. C, Conferences
- Journal Volume
- 4
- Journal Issue
- 7
- Journal Page Range
- p. 2318-2321
- ISSN
- 1610-1634
Conference
- Title
- International workshop on nitride semiconductors 2006 (IWN 2006)
- Dates
- 22-27 Oct 2006
- Place
- Kyoto (Japan)
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 38065775
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM NITRIDES; CHEMICAL COMPOSITION; CUBIC LATTICES; ENERGY SPECTRA; FILMS; GALLIUM NITRIDES; HETEROJUNCTIONS; INDIUM NITRIDES; LATTICE PARAMETERS; MOLECULAR BEAM EPITAXY; PLASMA; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON CARBIDES; SUBSTRATES; TEMPERATURE RANGE 0400-1000 K; X-RAY SPECTRA
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CARBIDES; CARBON COMPOUNDS; CRYSTAL GROWTH METHODS; CRYSTAL LATTICES; CRYSTAL STRUCTURE; EPITAXY; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR JUNCTIONS; SILICON COMPOUNDS; SPECTRA; SPECTROSCOPY; TEMPERATURE RANGE
Optional Information
- Notes
- With 4 figs., 11 refs.. SICI: 1610-1634(200706)4:7<2318::AID-PSSC200674915>3.0.TX;2-C