Published 1988 | Version v1
Book

Optical emission measurements in a pulsed, high power microwave discharge in low pressure air

  • 1. Chemical Physics Lab., SRI International, Menlo Park, CA (USA)

Description

The authors discuss their measurement of emission spectra over the 200- to 680-nm range and intensity histories at 337.1, 391.4, and 423.6 nm from microwave discharge plasmas, in low pressure air (0.01 to 3 torr). The discharges were formed at the constructive interference regions of an S-band microwave beam which was incident on an inclined metal plate. Spectra were recorded at --0.2-nm resolution using a scanning monochromator; the scans measured integrated light output averaged at any one wavelength over a few pulses, but gathered from a sequence of 10-Hz repetitive pulses lasting more than 10 minutes. Intensity-time histories of individual microwave pulses were measured using a pair of PMT's, each fitted with a bandpass filter of --2-nm bandpass at 337.1, 391.4, or 423.8 nm

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
Conference record of the 1988 IEEE international conference on plasma science (abstracts)
Imprint Pagination
160 p.
Journal Page Range
p. 84.

Conference

Title
IEEE international conference on plasma science.
Dates
6-8 Jun 1988.
Place
Seattle, WA (USA).

Optional Information

Notes
Imprint:Technical Paper 3P18.
Secondary number(s)
CONF-880651--.