The application of the plasma chemical reaction in the r.f ion source
Description
This paper introduced a cross science of the chemistry and the physics -- the technique of the plasma chemical reaction in applying the r.f. ion source. By this technique, the problem of drawing metal ions were solved. Especially, the problem of drawing the high volatilize temperature metal ions were solved. The ions drawn are: Re/sup +/, W/sup +/, Mo/sup +/, Pd/sup +/, Pt/sup +/, Ta/sup +/, Au/sup +/, Ag/sup +/, Ti/sup +/, Cr/sup +/, V+/sup +/, Fe/sup +/, Cu/sup +/, Si/sup +/, Al/sup +/, Mg/sup +/, Be/sup +/, Ga/sup +/, In/sup +/, Bi/sup +/, Li/sup +/, and the drawn ions of the rare earth element are: Y/sup +/, Ce/sup +/, Nd/sup +/ and so on. The technique has been used for five years in a 400Kev ion implenter in Beijing Normal University, good result has been obtained
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- Proceedings of the 1987 IEEE particle accelerator conference: Accelerator engineering and technology
- Journal Page Range
- p. 349-353.
Conference
- Title
- Particle accelerator conference.
- Dates
- 16-19 Mar 1987.
- Place
- Washington, DC (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19080048
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL REACTIONS; HIGH TEMPERATURE; ION SOURCES; IONS; KEV RANGE 100-1000; METALS; PLASMA
- Descriptors DEC
- CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; KEV RANGE