Published 1987 | Version v1
Book

The application of the plasma chemical reaction in the r.f ion source

Creators

  • 1. Institute of Low Energy Nuclear Physics, Beijing Normal Univ. (China)

Description

This paper introduced a cross science of the chemistry and the physics -- the technique of the plasma chemical reaction in applying the r.f. ion source. By this technique, the problem of drawing metal ions were solved. Especially, the problem of drawing the high volatilize temperature metal ions were solved. The ions drawn are: Re/sup +/, W/sup +/, Mo/sup +/, Pd/sup +/, Pt/sup +/, Ta/sup +/, Au/sup +/, Ag/sup +/, Ti/sup +/, Cr/sup +/, V+/sup +/, Fe/sup +/, Cu/sup +/, Si/sup +/, Al/sup +/, Mg/sup +/, Be/sup +/, Ga/sup +/, In/sup +/, Bi/sup +/, Li/sup +/, and the drawn ions of the rare earth element are: Y/sup +/, Ce/sup +/, Nd/sup +/ and so on. The technique has been used for five years in a 400Kev ion implenter in Beijing Normal University, good result has been obtained

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
Proceedings of the 1987 IEEE particle accelerator conference: Accelerator engineering and technology
Journal Page Range
p. 349-353.

Conference

Title
Particle accelerator conference.
Dates
16-19 Mar 1987.
Place
Washington, DC (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
19080048
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHEMICAL REACTIONS; HIGH TEMPERATURE; ION SOURCES; IONS; KEV RANGE 100-1000; METALS; PLASMA
Descriptors DEC
CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; KEV RANGE