Substantial tensile ductility in sputtered Zr-Ni-Al nano-sized metallic glass
Creators
- 1. California Institute of Technology (CalTech), Pasadena, CA (United States)
- 2. Institute of High Performance Computing (IHPC) (Singapore)
- 3. Carnegie Institution of Washington, Argonne, IL (United States)
- 4. Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai (China)
Description
We investigate the mechanical behavior and atomic-level structure of glassy Zr-Ni-Al nano-tensile specimens with widths between 75 and 215 nm. We focus our studies on two different energy states: (1) as-sputtered and (2) sputtered then annealed below the glass transition temperature (Tg). In-situ tensile experiments conducted inside a scanning electron microscope (SEM) reveal substantial tensile ductility in some cases reaching >10% engineering plastic strains, >150% true plastic strains, and necking down to a point during tensile straining in specimens as wide as ~150 nm. We found the extent of ductility depends on both the specimen size and the annealing conditions. Using molecular dynamics (MD) simulations, transmission electron microscopy (TEM), and synchrotron x-ray diffraction (XRD), we explain the observed mechanical behavior through changes in free volume as well as short- and medium-range atomic-level order that occur upon annealing. This work demonstrates the importance of carefully choosing the metallic glass fabrication method and post-processing conditions for achieving a certain atomic-level structure and free volume within the metallic glass, which then determine the overall mechanical response. Lastly, an important implication is that sputter deposition may be a particularly promising technique for producing thin coatings of metallic glasses with significant ductility, due to the high level of disorder and excess free volume resulting from the sputtering process and to the suitability of sputtering for producing thin coatings that may exhibit enhanced size-induced ductility.
Availability note (English)
Available from http://www.osti.gov/pages/biblio/1348209; DOE Accepted Manuscript full text, or the publishers Best Available Version will be available free of charge after the embargo periodAdditional details
Identifiers
Publishing Information
- Journal Title
- Acta Materialia
- Journal Volume
- 118
- Journal Issue
- C
- Journal Page Range
- p. 270-285
- ISSN
- 1359-6454
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United States
- INIS RN
- 48074520
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM; ANNEALING; DUCTILITY; FABRICATION; GLASS; METALLIC GLASSES; MOLECULAR DYNAMICS METHOD; NANOMATERIALS; NANOSTRUCTURES; NICKEL; PLASTICITY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SYNCHROTRONS; TRANSITION TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; ZIRCONIUM
- Descriptors DEC
- ACCELERATORS; CALCULATION METHODS; COHERENT SCATTERING; CYCLIC ACCELERATORS; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; HEAT TREATMENTS; MATERIALS; MECHANICAL PROPERTIES; METALS; MICROSCOPY; PHYSICAL PROPERTIES; SCATTERING; TENSILE PROPERTIES; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENTS
Optional Information
- Contract/Grant/Project number
- AC02-76SF00515; DGE-1144469; SC0006599; NNX12AQ49G; NAKFI ANT1; FG02-99ER45775; U1530402
- Funding organization
- USDOE (United States)
- Secondary number(s)
- OSTIID--1348209